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CuETP
EN: CW004A
UNS: C11000
MANUFACTURERS LIST

CuETP is the most common copper. It is universal for electrical applications. CuETP has a minimum conductivity rating of 100% IACS and is required to be 99.9% pure. It has 0.02% to 0.04% oxygen content (typical). Most ETP sold today will meet or exceed the 101% IACS specification. As with OF copper, silver (Ag) content is counted as copper (Cu) for purity purposes. C11000C (Electrolytic Tough Pitch Copper) is an electrolytic refined copper widely used for electrical and electronic applications. CuETP has the properties required in all applications with a hydrogen-free atmosphere. In the presence of H2 and heat all oxygen-bearing coppers suffer from so-called hydrogen embrittlement. This is a chemical reduction of copper oxide by diffusing hydrogen leading to formation of H2O within the microstructure, resulting in embrittlement of the grain boundaries. The phosphorus of our copper content is very low, so that electrical conductivity is comparable to the best performing materials. C1100 is an oxygen containing copper which has a very high electrical and thermal conductivity. It has excellent forming properties. Due to its oxygen content soldering and welding properties are limited. The alloy is registered US EPA antimicrobial. Due to its high copper content of about 99% Cu-ETP provides the full antimicrobial properties of copper to inhibit the growth of bacteria, viruses and fungi which are in contact for a short period of time on copper containing surfaces. Traditionally used ETP grade copper for electric applications, characterized by its content of hard copper oxides (Cu2O) with sizes of 5÷10 µm, which, for very small wire diameters, significantly decrease their ductility. Electrolytic Tough Pitch Copper is not suitable for case hardening. This material can be bent, soldered, drilled, riveted, and formed to almost any configuration. ETP Copper is available in round bar, squares, flat rectangular (bus bar), and certain profile shapes.

Literature

Basic properties

Basic properties
Density
[g/cm3]
Specific heat capacity
[J/(kg*K)]
Temperature coefficient of electrical resistance (0...100°C)
[10-3/K]
Electrical conductivity
[T=20°C, (% IACS)]
Thermal conductivity
[W/(m*K)]
Thermal expansion coefficient 20...300°C
[10-6/K]
8,89-8,98
Comments:
Solid state, temperature: 20°C

8,32
Comments:
Solid state, temperature: 1083°C

7,93
Comments:
Liquid state, temperature: 1083°C
385-386
3,7-4,0
93,15-100
Comments:
min, ASTM
388
Comments:
For high conductivity copper, a values of 387 is an adjusted value corresponding to an electrical conductivity of 101% IACS
17,7

Electrical conductivity is strongly influenced by chemical composition. A high level of cold deformation and small grain size decrease the electrical conductivity moderately. Minimum conductivity level can be specified

Variation of density with amount of cold reduction by rolling for CuETP (C11000) and similar coppers (CuETP1). A - vacuum annealed 12 h at 880 °C and cold drawn; B - vacuum annealed 12 h at 970 °C and flat rolled; C - vacuum annealed 12 h at 995 °C and cold drawn; D - hot rolled, vacuum annealed 4 h at 600 °C and drawn

Theoretical and measured density of ETP copper (density was calculated theoretically and then measured by Archimedes method)

Influence of impurity content on density ETP copper annealed at 700°C, 30min.

Content [%]

Density [g/cm3]

0,016 O2

8,91

0,04

8,90

0,06

8,90

0,09

8,88

0,27

8,84

0,36

8,76

0,016 O2

0,053 As

8,91

0,005

0,093

8,89

0,003

0,036

8,92

0,009

0,06

8,85

0,013

0,86

8,86

0,006

1,04

8,91

0,008 O2

0,0035 Sb

8,91

0,013

0,021

8,91

0,005

0,046

8,90

0,015

0,042

8,92

0,016

0,22

8,92

0,014

0,47

8,90

0,015 O2

0,002 Bi

8,90

0,016

0,006

8,92

0,015

0,015

8,98

0,014 O2

0,06 Fe

8,90

0,003

0,20

8,92

0,004

0,40

8,92

0,008

0,73

8,91

0,005

0,96

8,91

0,004

1,32

8,91

0,007

1,80

8,91

Remarks: Changes in the density of copper were very small for all considered impurities (from 8,76 to 8,98 g/cm3)

Effect of temperature on the density of ETP copper

Temperature [°C]

Density [g/cm3]

Reference

Calculated density * [g/cm3]

-173

9,017

20

8,962

100

8,925

200

8,88

500

8,732

600

8,70

8,656

700

8,62

8,605

800

8,54

8,554

900

8,46

8,506

1000

8,40

8,457

1083 liquid

8,00

Volume change on freezing - 4,92%

* Calculated according to the formula dt=d20/(1+3αΔt), where α is the coefficient of linear expansion. Underlined density values were used as a basis for calculations.

Electrical conductivity of CuETP, CuETP1 according to KME

The influence of impurities on the electrical conductivity of CuETP

Electrical resistivity vs strain of Cu-ETP wires in drawn and annealed state

 

Resistivity measurements for the ETP copper wire before and after annealing at 260°C (Physics Laboratory ENICA, Biskra)

Theoretical and measured values of thermal conductivity of ETP copper at the ambient temperature

Applications

Typical uses: produced in all forms except pipe and used for building fronts, downspouts, flashing, gutters, roofing, screening, spouting, gaskets, radiators, busbars, electrical wire, stranded conductors, contacts, radio parts, switches, terminals, ball floats, butts, cotter pins, nails, rivets, soldering copper, tacks, chemical process equipment, kettles, pans, printing rolls, rotating bands, roadbed expansion plates, vats. Automotive industry: radiators, gaskets. Builders hardware: cotter pins, butts, ball floats, tacks, soldering copper, rivets. Consumer: christmas ornaments. Electrical industry: transformer coils, switches, terminals, contacts, radio parts, busbars, terminal connectors, conductors, stranded conductors, cable strip. Fasteners. Industrial: printed circuit boards, stamped parts, pressure vessels, chemical process, equipment, chlorine cells, chimney cap screens, heat exchangers, printing rolls, anodes, rotating bands, pans, vats, heat sinks. Architecture: downspouts, flashing, roofing, gutters, building fronts, skylight frames, kitchen countertops.

Preferred applications: transformer, fuse, relay box, punshed screen, cable strip, current carrying capacity. Literature:

Forms Available: sheet, strip, plate for locomotive fireboxes, rod for locomotive staybolts, flat products, rod, bar and shapes, wire, conductors, tubular products, miscellaneous

CuETP (C11000)

Product

Specification

Literature

Plate for locomotive fireboxes

ASME SB11

Rod

SAE J463

MIL-C-12166

Rod for locomotive staybolts

ASME SB12

Sheet and strip

AMS 4500

Wire

AMS 4701

MIL-W-3318

MIL-W-6712

                                        

ASTM and federal specifications for CuETP (C11000)

Product and condition

Specification number

ASTM

Federal

Flat products:

  • General requirements for copper and copper alloy plate, sheet, strip and rolled bar

B248

-

  • Sheet, strip, plate and rolled bar

B152

QQ-C-576

  • Sheet, lead coated

B101

-

  • Sheet and strip for building construction

B370

-

  • Strip and flat wire

B272

QQ-C-502

  • Foil, strip and sheet for printed circuits

B451

-

Rod, bar and shapes:

  • General requirements for copper and copper alloy rod, bar and shapes

B249

-

  • Rod, bar and shapes

B133

QQ-C-502 ,

QQ-C-576

  • Rod, hot rolled

B49

-

  • Rod, bar and shapes for forging

B124

QQ-C-502

  • Busbars, rods and shapes

B187

QQ-B-825

Wire

  • General requirements for copper and copper alloy wire

B250

-

  • Hard drawn

-          Tinned

B1

B246

QQ-W-343

-

  • Medium-hard drawn

-          Tinned

B2

B246

QQ-W-343

-

  • Soft

-          Lead alloy coated

-          Nickiel coated

-          Rectangular and square

-          Tinned

B3

B189

B355

B48 , B272

B33

QQ-W-343

-

-

-

-

  • Silver coated

B298

-

  • Trolley

B47 , B116

-

Conductors

  • Bunch stranded

B174

 

  • Concentric-lay stranded

B8 , B226 , B496

 

  • Conductors for electronic equipment

B286 , B470

 

  • Rope-lay stranded

B172 , B173

 

  • Composite conductors (copper plus copper-clad steel)

B229

 

Tubular products

  • Bus pipe and tube

B188

QQ-B-825

  • Pipe

-

WW-P-377

  • Welded copper tube

B477

 

Miscellaneous

  • Standard classification of copper

B224

-

  • Electrolytic Cu wirebars, cakes, slabs, billets, ingots and ingot bars

B5

-

  • Anodes

-

QQ-A-673

  • Die forgings

B283

-

EN specification for CuETP (C11000)

Number

Title - products

EN 13601

Copper and copper alloys. Copper rod, bar and wire for general electrical purposes

EN 13600

Copper and copper alloys. Seamless copper tubes for electrical purposes

EN 13602

Copper and copper alloys. Drawn, round copper wire for the manufacture of electrical conductors

EN 1652

Copper and copper alloys. Plate, sheet, strip and circles for general purposes

EN 1976

Copper and copper alloys. Cast unwrought copper products

EN 1977

Copper and copper alloys. Copper drawing stock (wire rod)

EN 13599

Copper and copper alloys. Copper plate, sheet and strip for electrical purposes

EN 13605

Copper and copper alloys. Copper profiles and profiled wire for electrical purposes

EN 12165

Copper and copper alloys. Wrought and unwrought forging stock

EN 12420

Copper and copper alloys. Forgings

EN 13148

Copper and copper alloys. Hot-dip tinned strip

Chemical composition

Chemical composition
Value Comments
Ag [ wt.% ]0,0009

As [ wt.% ]6E-05

Bi [ wt.% ]1E-05

Cd [ wt.% ]1E-06

Co [ wt.% ]3E-06

Cr [ wt.% ]9E-06

Cu [ wt.% ]99,97884
Calculated
Fe [ wt.% ]0,00016

Mn [ wt.% ]4E-06

Ni [ wt.% ]0,00017

O2 [ wt.% ]0,019

P [ wt.% ]0,0002

Pb [ wt.% ]7E-05

S [ wt.% ]0,00028

Sb [ wt.% ]6E-05

Se [ wt.% ]1E-05

Sn [ wt.% ]3E-05

Te [ wt.% ]2E-05

Zn [ wt.% ]0,00018

* Chemical composition measured for wire rod (diameter 8.00 mm) obtained from Contirod technology

Composition limits: 99.90 Cu min (silver counted as copper). Silver has little effect on mechanical and electrical properties but does raise the recrystallization temperature and tends to produce a fine-grain copper. Iron as present in commercial copper, has no effect on mechanical properties, but even traces of iron can cause C11000 to be slightly ferromagnetic. Sulfur causes spewing and unsoundness, and is kept below 0.003% in ordinary refinery practice. Selenium and tellurium are usually considered undesirable impurities but may be added to improve machinability. Bismuth creates brittleness in amounts greater than 0.001%. Lead should not be present in amounts greater than 0.005% if the copper is to be hot rolled. Cadmium is rarely present; its effect is to toughen copper without much loss in conductivity. Arsenic decreases the conductivity of copper noticeably, although it is often added intentionally to copper not used in electrical service because it increases the toughness and heat resistance of the metal. Antimony is sometimes added to the copper when a high recrystallization temperature is desired

Chemical composition of CuETP1 according to EN 1976, EN 1977

Chemical composition, wt%

Ag

As

Bi

Cd

Co

Cr

Fe

Mn

Ni

O

P

Pb

S

Sb

Se

Si

Sn

Te

Zn

Cu

max.

0,00

25

 

0,00

05

1)

0,00

02

2)

-1)

-3)

-1)

0,00

10

3)

-1)

-3)

 

0,04

00

-1)

0,00

05

0,00

15

0,0004 1)

0,00

02 2)

-3)

-3)

0,00

02

-3)

-

1) (As + Cd + Cr + Mn + P + Sb) maximum 0,0015%

2)  (Bi + Se + Te) maximum 0,0003%, including (Se + Te) maximum 0,00030%

3)  (Co + Fe + Ni + Si + Sn + Zn) maximum 0,0020%

Literature:

 

Chemical composition of CuETP according to EN 1976, EN 1977

Chemical composition, wt%

Other named elements

Cu1)

Bi

O

Pb

max

max

min

(As + Bi + Cd + Co + Cr + Fe + Mn + Ni + O + P + Pb + S + Sb + Se + Si + Sn + Te + Zn) maximum 0,03%

99,90

0,0005

0,00402)

0,005

1) Including Ag with maximum 0,015%

 

2) Maximum permissible oxygen 0,060%

 

Literature:

Mechanical properties

Mechanical properties
UTS
[MPa]
YS
[MPa]
Elongation
[%]
HardnessYoung’s modulus
[GPa]
Kirchhoff’s modulus
[GPa]
Poisson ratio
220-395
69-365

80-120
Comments:
Soft Annealed

120-220
Comments:
Mechanical hardened
4-55
10-62
Comments:
HRB

40-95
Comments:
HRF

25-64
Comments:
HR30T

48
Comments:
HK

47
Comments:
HB (99,996 Cu annealed, grain size 0,07mm)
115
Comments:
O60 temper

115-130
Comments:
Cold-worked (H) temper

109,46-131
44
Comments:
O60 temper

44-49
Comments:
Cold-worked (H) temper

46

48

48,3
0,33

Variation of tensile properties with amount of cold reduction by rolling for Cu-ETP (C11000) and similar coppers (Cu-ETP1)

Variation of hardness with amount of cold reduction by rolling for Cu-ETP (C11000) and similar coppers (Cu-ETP1)

Typical mechanical properties of CuETP, CuETP1

Temper

UTS,

MPa

YS (a),

MPa

Elongation in A50, %

Hardness

Shear strength, MPa

Fatigue strength (b), MPa

HRF

HRB

HR30T

Flat products, 1 mm thick

OS050

220

69

45

40

-

-

150

-

OS025

235

76

45

45

-

-

160

76

H00

250

195

60

60

10

25

170

-

H01

260

205

70

70

25

36

170

-

H02

290

250

84

84

40

50

180

90

H04

345

310

90

90

50

57

195

90

H08

380

345

94

94

60

63

200

97

H10

395

365

95

95

62

64

200

-

H20

235

69

45

45

-

-

160

-

Flat products, 6 mm thick

OS050

220

69

50

40

-

-

150

-

H00

250

195

40

60

10

-

170

-

H01

260

205

35

70

25

-

170

-

H04

345

310

12

90

50

-

195

-

M20

220

60

50

40

-

-

150

-

Flat products, 25 mm thick

H04

310

275

20

85

45

-

180

-

Rod, 6 mm in diameter

H80 (40%)

380

345

10

94

60

-

200

-

Rod, 25 mm in diameter

OS050

220

69

55

40

-

-

150

-

H80 (35%)

330

305

16

87

47

-

185

115(c)

M20

220

69

55

40

-

-

150

-

Rod, 50 mm in diameter

H80 (16%)

310

275

20

85

45

-

180

-

Wire, 2 mm in diameter

OS050

240

-

35(d)

-

-

-

165

-

H04

280

-

1.5(e)

-

-

-

200

-

H08

455

-

1.5(e)

-

-

-

230

-

Tube, 25 mm outside diameter, 1.65 mm wall thickness

OS050

220

69

45

40

-

-

150

-

OS025

235

76

45

45

-

-

160

-

H55 (15%)

275

220

25

77

35

45

180

-

H80 (40%)

380

345

8

95

60

63

200

-

Shapes, 13 mm in diameter

OS050

220

69

50

40

-

-

150

-

H80 (15%)

275

220

30

-

35

-

180

-

M20

220

69

50

40

-

-

150

-

M30

220

69

50

40

-

-

150

-

(a) At 0.5% extension under load. (b) At 108 cycles. (c) At 3 × 108 cycles in a rotating beam test. (d) Elongation in 254 mm. (e) Elongation in 1500 mm.

 

Mechanical properties of CuETP, CuETP1 according to KME

Temper

UTS, MPa

YS, MPa

Elongation A50, %

Hardness HV

R220 (a)

220 - 260

< 140

33

40 - 65

R240

240 - 300

≥ 180

8

65 - 95

R290

290 - 360

≥ 250

4

90 - 110

R360

≥ 360

≥ 320

2

≥ 110

(a) Annealed

 

Mechanical properties of CuETP, CuETP1 (flat, round, square, hexagonal) according to EN13601 by Aurubis

Metallurgical State D

Dimensions, mm

Hardness

UTS MPa

YS,

MPa

Elongation

Round, square, hexagonal

Thickness

Width

HB

HV

A100 [%]

A

[%]

From

up to

To

From

Up to

To

From

Up to

To

Min.

Max.

Min.

Max.

D

2

-

80

0.5

-

40

1

-

200

Cold drawn product without any specific mechanical properties

H035 (a)

2

-

80

0.5

-

40

1

-

200

35

65

35

65

-

-

-

-

R200 (a)

2

-

80

1,0

-

40

5

-

200

-

-

-

-

200

Max.120

25

35

H065

2

-

80

0,5

-

40

1

-

200

65

90

70

95

-

-

-

-

R250

2

-

10

1,0

-

10

5

-

200

-

-

-

-

250

Min. 200

8

12

R250

2

10

30

-

-

-

-

-

-

-

-

-

-

250

Min. 180

-

15

R230

-

30

80

-

10

40

-

10

200

-

-

-

-

230

Min. 160

-

18

H085

2

-

40

0,5

-

20

1

-

120

85

110

90

115

-

-

-

-

H075

-

40

80

-

20

40

-

20

160

75

100

80

105

-

-

-

-

R300

2

-

20

1,0

-

10

5

-

120

-

-

-

-

300

Min. 260

5

8

R280

-

20

40

-

10

20

-

10

120

-

-

-

-

280

Min. 240

-

10

R260

-

40

80

-

20

40

-

20

160

-

-

-

-

260

Min. 220

-

12

H100

2

-

10

0,5

-

5

1

-

120

100

-

110

-

-

-

-

-

R350

2

-

10

1,0

-

5

5

-

120

-

-

-

-

350

Min. 320

3

5

(a) Annealed

 

Mechanical properties of CuETP, CuETP1 according to EN13606 by Aurubis

Metallurgical State

Dimensions, mm

Hardness

UTS MPa

YS,

MPa

Elongation

Thickness

Width

HB

HV

A100 [%]

A

[%]

Max.

Max.

Min.

Max.

Min.

Max.

Min.

D

50

180

Same as drawn

H035 (a)

50

180

35

65

35

70

-

-

-

-

R200 (a)

50

180

-

-

-

-

200

Max. 120

25

35

H065

10

150

65

95

70

100

-

-

-

 

R240

10

150

-

-

-

-

240

Min. 160

-

15

H080

5

100

80

115

85

120

-

-

-

-

R280

5

100

-

-

-

-

280

Min. 240

-

8

(a) Annealed

 

Mechanical properties of CuETP wire rod (diameter 8.0mm) used in electrical application

Material

CuETP

 

Production technology

-

Contirod, Southwire, Continuus Properzi

Chemical composition

Cu + Ag

[%wt]

99,95 – 99,97

99,98

Content by weight of elements

[ppm]

150

25

Oxygen

[ppm]

150 - 400

160 - 200

UTS

[MPa]

220 – 240

220

Elongation A250

[%]

40 – 45

45 – 50

Ductility

[mm]

0,2

0,05

                                    

Mechanical properties of CuETP, CuETP1 wire rod

Production technology

YS

UTS

Elongation A250

[MPa]

[MPa]

[%]

Contirod

140,0

220,7

42,3

Tensile stress characteristic of CuETP wire rod (diameter 8.0mm) from Contirod technology

Tensile stress characteristic of CuETP wire rod (diameter 8.0mm)  by Fujiwara

Tensile stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm)  after drawing process

Tensile stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm) after drawing process

UTS/YS ratio vs strain of Cu-OFE wires (diameter 0,5-8.0 mm) after drawing process

Elongation A250 vs strain of Cu-ETP wires (diameter 0,5-8.0 mm) after drawing process

Tensile stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm) after drawing process -logarithmic system

Tensile stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm) after drawing process -logarithmic system

Elongation vs strain of ETP copper (Cu min = 99,97% mass) wires in drawn and annealed state

Ultimate tensile strength vs strain of ETP copper (Cu min = 99,97% mass) wires in drawn and annealed state

Elongation and ultimate tensile strength of ETP copper before and after annealing

ε [%]

Before annealing

After annealing

A [%]

Rm [N/mm2]

A [%]

Rm [N/mm2]

0

39

235

39

233

47,97

4

322

40

239

71,64

2,5

414

38

245

91,66

2

464

38

253

 

 

Influence of grain size on tensile properties of ETP copper

Grain size [mm]

UTS [MPa]

0,5% Proof Stress [MPa]

Reduction in area [%]

0,03

248

104

77

0,15

234

93

62

Vickers microhardness curve of the ETP copper wire after cold wire drawing [601]

Evolution of the Vickers microhardness of the ETP copper wire (after annealing at 260°C) as a function of holding time

Hardness HBW of ETP copper (applying Brinell Hardness tester with the ball of 2,5 mm and load of 625 N)

Microhardness of ETP copper in the present study and ETP copper as

functions of N and corresponding equivalent strain, before and after normalization (diameter of wire 1mm).

Remark: The relation H vs wr depends on the crystal structure of the pure metals.

Dependence of the hardness at room temperature on the total specific heat capacity wr for ETP copper (Kgm/cm3=KG/mm2)

Influence of various additional elements on the elastic modulus of copper

Effect of homologous temperature on Young’s modulus E of ETP copper

The dependence Young’s modulus E versus specific heat capacity wr at room temperature

Exploitation properties

Effect of low temperatures on the mechanical properties of Cu-ETP

Metal and crystal

structure

Material condition

Temperature [°C]

Tensile strength

/yield limit [Mpa]

Elongation [%]

Reduction of area [%]

Cu 99,90; K12

Bar 10mm, annealed at 800°C

17

-

29

70

-191

-

41

72

-253

-

48

48

Remarks: As can be seen from the table, ETP copper (FCC metal) preserve ductility at low temperatures.

Influence of temperature on the mechanical properties of annealed (600°C), forged ETP copper

Temperature [°C]

Tensile Strength [MPa]

Elongation [%]

Reduction in area [%]

20

220,0

32

67-75

160

184,0

32

71

300

132,0

30

50

410

85,0

19

24

555

48,5

14

19

650

33,0

15

20

790

19,0

14

34

970

8,0

6

15

 

 

Mechanical properties of ETP copper as a function of temperature (-180°C to +600°C)

Temperature [°C]

Tensile Strength [MPa]

Elongation [%]

Reduction in area [%]

-180

408

58

72

-120

288

45

70

-80

270

47

74

-40

236

47

77

-20

220

48

76

20*

190

36

67

300

183

42

62

400

150

43

74

500

130

45

75

600

115

37

65

* Above zero temperature measurements were performed with wire speciments of 5mm diameter and 160mm length.

 

 

Influence of impurity content on tensile properties of ETP copper annealed at 700°C, 30min.

Content [%]

Tensile strength [MPa]

Elongation [%]

Reduction of area [%]

0,016 O2

227

54

77

0,04

 

224

50

72

0,06

 

227

56

70

0,09

 

231

53

65

0,27

 

241

49

57

0,36

 

259

55

39

0,016 O2

0,053 As

220

57

72

0,005

0,093

224

57

70

0,003

0,036

227

60

79

0,009

0,06

234

55

62

0,013

0,86

238

56

66

0,006

1,04

238

59

79

0,008 O2

0,0035 Sb

220

63

75

0,013

0,021

224

63

74

0,005

0,046

224

60

72

0,015

0,042

234

49

73

0,016

0,22

231

67

77

0,014

0,47

234

58

66

0,015 O2

0,002 Bi

224

66

68

0,016

0,006

231

62

72

0,015

0,015

231

64

72

0,014 O2

0,06 Fe

227

57

73

0,003

0,20

224

60

73

0,004

0,40

234

60

80

0,008

0,73

262

52

80

0,005

0,96

252

45

82

0,004

1,32

301

30

79

0,007

1,80

311

29

79

Remarks: A stronger change in tensile strength and elongation was observed only for Fe addition with a content of more than one percent. For all impurities, with the exception of those mentioned above (>1%), tensile strength was 220 to 262 MPa and elongation was about 45 to 67%, which indicated good ductility properties.

Dependence of tensile strength of ETP copper on its homologous temperature Th

Mechanical properties vs temperature of Cu-ETP wire rod (diameter 8.0mm) after 1 hour annealing process (At temperatures from 100 °C to 400 °C the UTS of Cu-ETP wire rod is stable, while in the temperature range of 500 °C to 900 decreases)

 

Elongation A250 vs temperature of Cu-ETP wire rod (diameter 8.0mm) after 1 hour annealing process

Variation of tensile properties and grain size of electrolytic tough pitch copper (Cu-ETP) and similar coppers (Cu-ETP1)

Short-time elevated-temperature tensile properties of Cu-ETP (C11000) and similar coppers (Cu-ETP1)

Low-temperature tensile properties of Cu-ETP (C11000) and similar coppers (Cu-ETP1)

Remark: For ETP copper, as for pure aluminium (both FCC metals), the difference between the Rm and Re magnitudes is larger at low temperature than at room temperature, unlike the BCC metals Cr, Ta and V.

Effect of temperature on the tensile strength Rm and yield limit Re of Cu-ETP

Tension stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm) obtained from wire rod after annealing process

Tensile stress characteristic of Cu-ETP wires (diameter 0.5-8.0 mm) obtained from wire rod after annealing process

Elongation vs strain of Cu-ETP wires (diameter 0.5-8.0 mm) obtained from wire rod after annealing process

Remarks: The diagrams lack a physical yield point.

Compression diagrams at 20°C and -180°C of Cu-ETP ductile at low temperatures

 

Effect of elevated temperatures on the Knoop hardness HK of ETP copper

Temperature [°C]

Knoop hardness HK [kg/mm2]

20

48

100

47

200

36

300

28,8

400

22,3

500

27,5

600

10

700

8

800

7,4

900

3,5

Softening resistance of Cu-ETP

Microhardness dependence on the annealing temperature for ETP copper samples subjected to ECAP with and without back pressure (BP)

Dependence of the Knoop hardness HK at 0°K (-273,15°C) on the total molar heat capacity W0 for ETP copper

Thermal expansion and enthalpy of Cu-ETP. (a) Total thermal expansion from -190 °C. (b) Enthalpy (heat content) above 0 °C

Thermal conductivity of Cu-ETP in different temperature

Temperature

Thermal conductivity

K

°C

W/m·K

4.2

-268.8

300

20

-253

530

77

-196

550

194

-79

400

273

0

390

373

100

380

573

300

370

973

700

300

Effect of temperature on the thermal conductivity of ETP copper

Temperature

Thermal conductivity

K

°C

W/m·K

100

-173,15

483

200

-73,15

413

300

26,85

398

400

126,85

392

600

326,85

383

800

526,85

371

1000

726,85

357

1200

926,85

342

1400

1126,85

167

1600

1326,85

174

Thermal conductivity measurements derived from the thermal diffusivity data for ETP copper

Differential Scanning Calorimetry (DSC) of ETP copper (Differential scanning calorimetry DSC measurements were carried out in order to find out the reason for the change in the TC slope at 200 °C – Fig. above)

 

Thermal conductivity of ETP copper vs temperature (temperature range -200 to +25°C and range +50 to +600 °C). Measurements were performed by two methods. First method was based on the axial stationary heat flow in the temperature interval -200 to +25°C, namely from thetemperature of liquid nitrogen to room temperature. Second applied method of measurements in the temperature range +50 to +600 °C, was based on indirect measurements at 50, 100, 200, 400 and 600°C, where thermal diffusivity on the nonlinear mathematical Cape-Lehman model was calculated, taking into account radiation losses, an atmosphere of protective gas-argon and the covering of samples with graphite on both sides

Comparison between the nominal thermal conductivity curve for ETP copper RRR 50 (solid line) and the control sample. In theinset four different runs are displayed, showing the reproducibility of our measurements and allowing a better determination of the peak temperature

Thermal conductivity of the ETP copper. The three lines display the thermal conductivity of copper for diferent levels of RRR in order to evaluate those of the copper within the samples

Effect of temperature on the electrical resistivity of ETP copper

Temperature

Electrical resistivity, µΩcm

K

°C

100

-173,15

0,348

200

-73,15

1,046

300

26,85

1,725

400

126,85

2,402

600

326,85

3,792

800

526,85

5,262

1000

726,85

6,858

1200

926,85

8,626

1400

1126,85

21,01

1600

1326,85

23,42

 

 

Electrical resistivity of ETP copper at subsero temperatures

Temperature

Electrical resistivity, µΩcm

K

°C

1

-272,15

0,002

20

-253,15

0,0028

40

-233,15

0,0239

60

-213,15

0,0971

80

-193,15

0,215

100

-173,15

0,348

150

-123,15

0,699

200

-73,15

1,046

273

-0,15

1,543

Softening resistance of cold drawn Cu-ETP wires

Softening resistance of cold drawn Cu-OFE wires 

Effect of the content of different elements added to ETP copper on its recrystallization temperature

Content [%]

Recrystallization temperature [°C]

0,24 Sn

375

0,24 Ag

340

0,19 Pb

325

0,24 Mg

320

0,36 P

325

0,19 Cd

300

0,06 Sb

280

0,21 S

275

0,14 As

250

0,21 Ni

250

0,20 Au

250

0,06 Si

245

0,33 Zn

220

0,027 Bi

200

0,21 Fe

190

0,12 Al.

150

Recrystallization temperature of ETP copper t = 205°C

Remarks: The effect of foreign atoms on the recrystallization temperature is strongly connected with the type of foreign atoms. Inclusion of foreign atoms mostly increases the recrystallization temperature. In some rare cases (Al, Fe and Bi) impurities decrease the recrystallization temperature. The largest increase of this temperature was for 0,24% Sn (Δt=170°C).

 

Increase in the recrystallization temperature of ETP copper (205°C) by the addition of 0,01 atomic percent of the indicated element

Added element

Increase in recrystallization temperature [°C]

Ni

0

Co

15

Fe

15

Ag

80

Sn

180

Te

240

Remarks: For Te and Se, the increase in the recrystallization temperature is very high.

 

Influence of temperature on Young’s modulus (E) of annealed ETP copper

Temperature [°C]

Young's modulus [GPa]

-183

136

20

129

400

111

600

95,1

950

65

Relation between hardness and Young’s modulus of ETP copper at -200°C

Mechanical properties vs temperature of Cu-ETP wire rod (diameter 8.0mm) after 24 hours annealing process

Elongation A250 vs temperature of Cu-ETP wire rod (diameter 8.0mm) after 24 hours annealing process

Percentage reduction of area vs temperature of Cu-ETP wire rod (diameter 8.0mm) after 24 hours annealing process

Half-softening temperature of Cu-ETP wire

Diameter of wire

Strain

Half-softening temperature

[mm]

[-]

[°C]

7,0

0,28

265

5,5

0,76

210

4,5

1,16

210

2,5

2,38

175

0,5

5,59

125

CuETP (C11000) is subjected to embrittlement when heated to 370 °C or above in a reducing atmosphere, as in annealing, brazing or welding. If hydrogen or carbon monoxide is present in the reducing atmosphere embrittlement can be rapid. Literature:

Type of corrosion

Suitability

Literature

Atmospheric

Good

Marine environment

Good

Stress crack

Good

Hydrogen embrittlement

CuETP (C11000) is subjected to embrittlement when heated to 370 °C or above in a reducing atmosphere, as in annealing, brazing or welding. If hydrogen or carbon monoxide is present in the reducing atmosphere embrittlement can be rapid

Electrolytic

Good

Other

C11000 has excellent corrosion resistance to weathering and very good resistance to many chemicals. It is often used specifically for corrosion resistance. It is suitable for use with most waters, and can be used underground because it resists soil corrosion. It resists non-oxidising mineral and organic acids, caustic solutions and saline solutions. Depending on concentration and specific conditions of exposure, copper generally resists: acids mineral acids such as hydrochloric and sulphuric acids; organic acids such as acetic acid (including acetates and vinegar), carbolic, citric, formic, oxalic, tartaric and fatty acids; acidic solutions containing sulphur, such as the sulphurous acid and sulphite solutions used in pulp mills. Alkalies fused sodium and potassium hydroxide; concentrated and dilute caustic solutions. Salt solutions aluminium chloride, aluminium sulphate, calcium chloride, copper sulphate, sodium carbonate, sodium nitrate, sodium sulphate, zinc sulphate. Waters all potable waters, many industrial and mine waters, seawater and brackish water. The corrosion resistance of C11000 is not adequate for: ammonia, amines and ammonium salts; oxidizing acids such as chromic and nitric acids and their salts; ferric chloride; persulphates and perchlorates; mercury and mercury salts. Copper may also corrode in aerated non oxidising acids such as sulphuric and acetic acids, although it is practically immune from these acids if air is completely excluded. Copper is not suitable for use with acetylene, which can react to form an acetylide which is explosive. C11000 is considered to be immune to stress corrosion cracking in ammonia and the similar media which cause season cracking in brass and other copper alloys.

www.copper.org

ETP copper corrosion in the formic and carboxylic acid

Two experiments were performed in which the relative humidity was kept constant during a major part of the exposure and only the formic acid concentration was varied. Three Cu-500 nm and three Cu-85 nm sensors were exposed to air at 80% and 60% RH, respectively, with increasing acid concentrations. It should be noted that due to the use of different permeation tubes with formic acid, the concentrations were slightly different in the two experiments. An example of the corrosion depth record for a Cu-500 nm sensor is plotted in Fig. below. The other records were similar. The experiment started in clean air at 15% RH. The corrosion rate was below the detection limit until the relative humidity was increased to 70%. The corrosion rate stabilized at about 0.01 nm/day after 4 days and did not change even though the relative humidity was increased to 80% RH. Formic acid did not have a dramatic effect on copper corrosion when present at concentrations from 10 to 220 ppb. When the formic acid concentration was increased to 460 ppb, the corrosion rate changed to 0.05 nm/day. It stayed at this level at 1000 ppb as well. An additional increase in the corrosion rate to 0.14 nm/day was recorded at the maximal formic acid concentration of 1590 ppb. The corrosion rate decreased gradually to low values when the formic acid concentration was lowered to 190, 80 and 0 ppb. Cu-85 nm sensors were used in a similar experiment with a lower maximal relative humidity of 60%. Corrosion rates extracted from stabilized parts of the corrosion depth vs. time records are given in Table below. Analogously to the previous experiment at 80% RH, the corrosion rate of copper only increased above about 0.01 nm/day when the concentration of formic acid was raised from 210 ppb to 420 ppb. Indeed, the increase was stronger under the wetter conditions. Whereas the corrosion rate continued to increase in more contaminated air at 80% RH, it remained nearly constant at 0.04 ± 0.01 nm/day at 60% RH until the formic acid concentration was raised to 2880 ppb .

Corrosion depth measured in air containing formic acid using a Cu-500 nm sensor; numbers give concentration of formic acid in ppb and relative humidity in per cent

Corrosion rate of ETP copper sensors after stabilization in the presence of formic acid

c(HCOOH), ppb

Corrosion rate, vcorr, nm/day

60% RH

80% RH

0

0,014±0,003

0,010±0,005

30-60

0,013±0,003

0,013±0,002

80-100

0,013±0,002

0,009±0,003

210-220

0,015±0,003

0,012±0,001

420-460

0,050±0,014

0,053±0,003

1000-1180

0,047±0,011

0,051±0,002

1550-1590

0,034±0,005

0,143±0,002

2880

0,043±0,003

-

Corrosion rates as a function of the relative humidity and carboxylic acid concentration; (a) copper and formic acid; experimental points:vcorr≤0,015 nm/day,0,015<vcorr≤0,06nm/day,vcorr>0,06 nm/day

 Relaxation at stress level 0.5 × Yield Strength

Stress relaxation curves for Cu-ETP (C11000) and similar coppers (Cu-ETP1). Data are H80 temper wire, 2 mm in diameter, and represent the time-temperature combination necessary to produce a 5% reduction in tensile strength

Creep properties of CuETP, CuETP1 (C11000)

Temper

Testing temperature

Stress

Duration of test

Total extension(a)

Intercept

Minimum creep rate

°C

MPa

h

%

%

% per 1000 h

Strip, 2.5mm thick

OS030

130

55

2500

2.6

2.0

0.15

100

2600

10.0

7.6

1.2

140

170

29.8(b)

-

39

175

55

2000

3.3

2.3

0.65

100

350

15(b)

8.0

6.3

H01

130

55

8250

0.20

0.15

0.01

100

8600

0.67

0.26

0.042

140

1750

2.4(b)

0.32

0.45

175

55

6850

1.14

0.14

0.088

100

1100

2.0

0.22

0.66

H02

130

55

7200

0.24

0.13

0.01

100

8600

1.02

0.25

0.054

140

4680

3.4(b)

0.36

0.27

175

55

1050

3.3(b)

-

0.6

H06

130

55

8250

1.58

0.08

0.035

100

8700

7.31

0.16

0.055

140

4030

11(b)

0.24

0.17

Rod, 3.2 mm diameter

OS025

260

2.5

6000

0.08

0.016

0.011

4.1

6000

0.19

0.010

0.030

7.2

6500

0.64

0.113

0.080

13.8

6500

2.88

0.87

0.306

H08

205

7.2

6500

0.06

0.045

0.011

14.5

6500

0.20

0.112

0.012

28

6500

1.08

0.41

0.097

50

6500

5.42

2.47

0.44

(a) Total extension is initial extension (not given in table) plus intercept plus the product of minimum creep rate and duration.

(b) Rupture test

Literature:

Creep-rupture strength for ETP copper for 100 hours creep

Temperature, °C

R100, MPa

650

90

730

40

810

22

Values given below apply to any of the unalloyed copper in contact with the indicated materials without lubrication of any kind between the contacting surfaces:

Opposing material

Coefficient of friction

Static

Sliding

Carbon steel

0.53

0.36

Cast iron

1.05

0.29

Glass

0.68

0.53

Literature:

Temper

Fatigue strength at 108 cycles in a reversed bending test , MPa

Flat products, 1 mm thick

OS025

76

H02

90

H04

90

H08

97

Rod, 25 mm in diameter

H80 (35%)

115 (At 3 × 108 cycles in a rotating beam test)

Literature:

Values  shown in table  are typical for all tough pitch, oxygen-free, phosphorus-deoxidized and arsenical coppers. Copper does not exhibit an endurance limit under fatigue loading and, on the average, will fracture in fatigue at the stated number of cycles when subjected to an alternating stress equal to the corresponding fatigue strenght (see Fig.)

Rotating-beam fatigue strength of Cu-ETP (C11000) wire, 2 mm in diameter, H80 temper

The fatigue strength is defined as the maximum bending stress amplitude which a material withstands for 107 load cycles under symmetrical alternate load without breaking. It is dependent on the temper tested and is about 1/3 of the tensile strength .

Influence of impurity content on fatigue limit of ETP copper annealed at 700°C, 30min.

Content, %

Fatigue limit, MPa

0,016 O2

 

77

0,04

 

94

0,06

 

91

0,09

 

84

0,27

 

77

0,36

 

77

0,016 O2

0,053 As

98

0,005

0,093

101

0,003

0,036

95

0,009

0,06

101

0,013

0,86

105

0,006

1,04

108

0,008 O2

0,0035 Sb

84

0,013

0,021

91

0,005

0,046

91

0,015

0,042

91

0,016

0,22

108

0,014

0,47

122

0,015 O2

0,002 Bi

94

0,016

0,006

94

0,015

0,015

105

0,014 O2

0,06 Fe

98

0,003

0,20

94

0,004

0,40

10,1

0,008

0,73

10,1

0,005

0,96

10,5

0,004

1,32

10,8

0,007

1,80

11,2

Fatigue factor S/Rm of ETP copper in annealed condition versus the homologous temperature (T/Tmp = ratio of room temperature to melting point, in °K)

Remark: For FCC pure metals there exists a nearly common linear dependence of the fatigue limit on the tensile strength.

Fatigue limit versus tensile strength of recrystallized ETP copper

Remark: The fatigue limit depends on the tensile strength of the metal.

Fatigue limit Stc of ETP copper versus tensile strength Rm at different temperatures

Fatigue factor Stc/Rm of ETP copper at low temperatures

Dependence of fatigue limit σd and tensile strength Rm on the total heat capacity wr at room temperature for ETP copper

Summary table of fatigue limits of ETP copper at room temperature

Metal

Type of material

Corresponding mechanical

properties in MPa

and elongation, %

Fatigue limit, MPa

Basic number

of cycles

References

Cu 99,98

Annealed at 700°C rod

Rm=227

El. 57%

Red of Area 72%

Reversed Bending 70

5∙102

Cu 99,96

Annealed at 710°C/30min.

Rm=203

El. 60%

Reversed Bending 87

3∙107

Cu 99,96 HC

(high conductivity)

Annealed

Rm=220

Reversed Bending 76,5

3∙107

Cu 99,92; 0,05 O2

(high conductivity)

Annealed tape

 

 

Cold-rolled tap, cold-worked 20%

Rm=228

Reversed Bending 77,1

 

Reversed Bending 91,3

108

 

 

 

108

 

 

 

Cu 0,016 O2

Annealed at 700°C/30min.

Rm=227

El. 54%

Red of Area 77%

Reversed Bending 77,1

5∙107

Cu 0,17 O2

Rm=241

El. 49%

Red of Area 57%

Reversed Bending 77

5∙107

Cu 0,008 O2; 0,22 Sb

Annealed 700°C/0,5h

Rm=231

El. 67%

Red of Area 77%

Reversed Bending 108

2∙107

Cu 99,91 electrolytic;

0,032 Fe; 0,05 Zn

Rolled and annealed

Rm=244

Red of Area 95%

Reversed Bending 108

Rotating Beam 74

2∙107

Typical impact strength of Cu-ETP (Cu-ETP1)

Product and condition

Impact strength, J

Charpy V-notch

Hot rolled, annealed

96

Charpy keyhole-notch

As-cast

11

As-hot rolled

43

Rod

  • Annealed
  • Commercial temper

 

52

35

Izod

Rod

  • Annealed and drawn 30%
  • Drawn 30%

 

54

45

Plate

  • As-hot rolled
  • Annealed

 

 

52

53(a)

39(b)

Cold rolled 50%

26(a)

12(b)

(a) Parallel to rolling direction. (b) Transverse to rolling direction

Literature:

Fabrication properties

Fabrication properties
Value Comments
SolderingExcellent

BrazingGood

Hot dip tinningExcellent

Electrolytic tinningExcellent

Electrolytic silveringExcellent

Electrolytic nickel coatingExcellent

Laser weldingLess suitable

Oxyacetylene WeldingNot Recommended

Gas Shielded Arc WeldingNot Recommended

Coated Metal Arc WeldingNot Recommended

Resistance weldingLess suitable

Spot WeldNot Recommended

Seam WeldNot Recommended

Butt WeldGood

Capacity for Being Hot FormedExcellent

Forgeability Rating65

Machinability Rating20
Less suitable
Technological properties

Technological properties
Melting temperature
[°C]
Casting temperature
[°C]
CastabilityAnnealling temperature
[°C]
Homogenization temperature
[°C]
Quenching temperature
[°C]
Ageing temperature
[°C]
Stress relievieng temperature
[°C]
Hot working temperature
[°C]
1083
1140-1200
No data 475-750
No data No data No data 150-200
750-875

Time - temperature relationships for annealing Cu-ETP and similar coppers (Cu-ETP1)

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